Deposition & Growth
High temperature furnace for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.
High temperature deposition of most metals and some ceramics.
Sputtered deposition of various materials including Tungsten, Silicon Nitride, Silicon Dioxide, and Chrome.
Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon nitride films.
Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.
Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.
TEMlab Electron Beam and Thermal Evaporator
High temperature deposition of most metals and some ceramics.
Multi-boat metal deposition of gold and aluminum.