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Electrical & Computer Engineering
Integrated Microfabrication Lab
Machine Scheduler

Deposition & Growth

Bruce Furnace

High temperature furnace for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.

    Denton E-beam Evaporator

    High temperature deposition of most metals and some ceramics.

      Denton Sputtering Machine

      Sputtered deposition of various materials including Tungsten, Silicon Nitride, Silicon Dioxide, and Chrome.

        PlasmaTherm 1

        Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon nitride films.

          PlasmaTherm 2

          Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.

            PECVD 3

            Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.

            TEMlab Electron Beam and Thermal Evaporator

            High temperature deposition of most metals and some ceramics.

              Thermal Evaporator

              Multi-boat metal deposition of gold and aluminum.