Deposition & Growth
High temperature furnance for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.
High temperature deposition of most metals.
Sputtered deposition of various materials including Tungsten, Silicon Nitride, Silicon Dioxide, and Chrome.
Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon nitride films.
Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.
Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.
Multi-boat metal deposition of gold and aluminum.