Headway Spinner

Application of AZ3330, SU-8, polyimide, and other photoresists.

    Laurell Spinner

    Application of AZ3330, SU-8, polyimide, and other photoresists.

      MA150 Karl Suss Aligner

      High-fidelity mask exposure, capable of feature sizes down to .5 microns.

        Heidelberg DWL 66FS Laser Mask Writer

        Used to create custom photolithographic masks from a user-specified layout.

          Solitec Spinner

          Spinnable material application. This spinner is not restricted to photoresist application and may be used for coatings such as spin-on glass, SU8, polyimide, etc. Can also be used for wafer cleaning.

            Deep UV Chamber (Under Construction)

            (Under Construction)

              Mask Developing Bench (Under Construction)

              (Under Construction)