Silicon Nitride RIE Etching
Equipment: Reactive Ion Etcher (RIE)
SCHEDULER IS REQUIRED
Simple Recipe
- Recipe
- Power: 100 W
- Pressure: 100 mTorr
- Gases: 3.1 SCCM O2, 25 SCCM CF4
- Etch Rate: unknown
- Selectivity: unknown
Equipment: Reactive Ion Etcher (RIE)
SCHEDULER IS REQUIRED
Simple Recipe