Silicon Dioxide RIE Etching
Equipment: Reactive Ion Etcher (RIE)
SCHEDULER IS REQUIRED
Simple Recipe
- Recipe
| Power (Watts) | Etch Rate (nm) | Selectivity vs. Photoresist |
| 100 | 27.5 | 0.9 |
| 200 | 79.4 | 0.487 |
| 250 | 121 | 0.759 |
| 300 | 144 | NA |
Equipment: Reactive Ion Etcher (RIE)
SCHEDULER IS REQUIRED
Simple Recipe
| Power (Watts) | Etch Rate (nm) | Selectivity vs. Photoresist |
| 100 | 27.5 | 0.9 |
| 200 | 79.4 | 0.487 |
| 250 | 121 | 0.759 |
| 300 | 144 | NA |