Bruce Tube Furnace

High temperature furnance for wafer thermal oxide growth, wafer dopant diffusion, and metallization annealing.

    Denton E-beam Evaporator

    High temperature deposition of most metals.

      Denton Sputtering Machine

      Sputtered deposition of various materials including Tungsten, Silicon Nitride, Silicon Dioxide, and Chrome.

        PECVD 1

        Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon nitride films.

          PECVD 2

          Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.

            PECVD 3

            Plasma deposition of SiO2, SiOxNy, and Si3N4films. This machine is currently dedicated to producing silicon dioxide films.

              Thermal Evaporator

              Multi-boat metal deposition of gold and aluminum.